Advanced Ta-Based Diffusion Barriers for Cu Interconnects

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Advanced Ta-Based Diffusion Barriers...

Advanced Ta-Based Diffusion Barriers for Cu Interconnects

Name: Advanced Ta-Based Diffusion Barriers for Cu Interconnects
ISBN: 9781607416753

Rene Hubner

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It is the aim of this book to carry out microstructure and functional property investigations for advanced, high-performance Ta-based diffusion barriers before and after annealing to compare their thermal stabilities and to probe the corresponding failure mechanisms.

Categories:

Engineering

Language:

english

Pages:

103

ISBN 10:

1607416751

ISBN 13:

9781607416753

File:

PDF, 1.69 MB