Polymer Materials for Electronic Applications

Content: A sensitive positive-working cross-linked methacrylate electron resist / E.D. Roberts --
Radiation degradation and film solubility rates of poly(butene-1-sulfone) / Larry Stillwagon --
Poly(methyl methacrylate-co-3-oximino-2-butanone methacrylate-co-methacrylonitrile) : a deep-UV photoresist / E. Reichmanis and C.W. Wilkins, Jr. --
Compositional analysis of a terpolymer photoresist by raman spectroscopy / F.J. Purcell, E. Russavage, E. Reichmanis, and C.W. Wilkins, Jr. --
Effect of composition on resist dry-etching susceptibility : vinyl polymers and photoresists / J.N. Helbert and M.A. Schmidt --
Poly(N-alkyl-o-nitroamides) : a new class of thermally stable, photosensitive polymers / S.A. MacDonald and C.G. Willson --
A new approach to high-resolution lithography based on conducting organic charge transfer salts / E.M. Engler, Y. Tomkiewicz, J.D. Kuptsis, R.G. Schad, V.V. Patel, and M. Hatzakis --
Polyimide for multilevel very large-scale integration (VLSI) / Gay Samuelson --
Polyimide coatings for microelectronic applications / Y.K. Lee and J.D. Craig --
Development of polyimide isoindoloquinazolinedione in multilevel interconnections for large-scale integration (LSI) / Atsushi Saiki, Kiichiro Mukai, Seiki Harada, and Yasuo Miyadera --
Characterizing polyimide films for semiconductor application / A.M. Wilson, D. Laks, and S.M. Davis --
Implications of electronic and ionic conductivities of polyimide films in integrated circuit fabrication / George A. Brown --
Improved room-temperature vulcanized (RTV) silicone elastomers as integrated circuit (IC) encapsulants / Ching-Ping Wong --
Synthesis and properties of branched epoxy resins / Jon F. Geibel --
Characterization of cured epoxy powder coatings by solvent absorption / W.A. Romanchick and J.F. Geibel --
Thermal degradation of polymers for molded integrated circuit (IC) devices : the effect of a flame retardant / R.M. Lum and L.G. Feinstein --
Electrical switching and memory phenomena in semiconducting organic thin films / R.S. Potember and T.O. Poehler.